Closed Loop Vapor Dryer (CLV) – Supplied by Silicon Valley Sales
At Silicon Valley Sales, we proudly supply the advanced Closed Loop Vapor Dryer (CLV) by JST—a patented drying solution that combines two proven technologies: vacuum and isopropyl alcohol IPA drying. This innovative system is available as a standalone unit or fully integrated into a JST Wet Bench.
Closed Loop Vapor Dryer (CLV) Overview
In the CLV Dryer, IPA vapor is remotely generated and introduced into the drying chamber, where it displaces water. The vapor is then extracted and replaced with ultrapure nitrogen. This closed-loop process ensures low particle drying for blind holes, vias, and high aspect ratios, while also reducing IPA usage and emissions.
Ideal for silicon wafer, II-VI compound wafer, MEMS, glass substrates, and optics, the CLV Dryer offers a typical cycle of 10–20 minutes, consuming an average of 60mL IPA per cycle with < 20 adders @ 0.16um. Emissions remain below one pound per day.
Built for easy maintenance and backed by JST’s 24/7 Technical Support, it’s a high-performance drying tool trusted worldwide.
Frequently Asked Questions
1. What drying technologies does the CLV Dryer use?
It uses a combination of vacuum and isopropyl alcohol IPA drying.
2. How long is the typical dry cycle?
Between 10 and 20 minutes, depending on the carrier and product type.
3. What is its IPA usage per cycle?
It consumes an average of 60mL IPA per drying cycle.
4. Which applications is it suitable for?
Silicon wafers, II-VI compound wafers, MEMS, glass substrates, and optics.
5. Can it be used standalone or only in wet benches?
It is available as a standalone system or integrated into a JST Wet Bench.
Ready to Improve Your Wafer Drying Performance?
Silicon Valley Sales is your trusted supplier of the Closed Loop Vapor Dryer (CLV) by JST.
Contact us today for detailed specs, pricing, or to request a quote. Let’s elevate your cleanroom processing!