The POLOS® Print UV Standard is a maskless lithography equipment, based on a Digital Micromirror Device projection technology (DMD), compatible with a wide range of resists and substrates. This system can produce any 2D shapes at micron resolution without the need for a hard-mask.Inquire
Key features
Writing resolution down to 1.5 µm
Adjustable writing field and resolution with exchangeable objectives
Compatible with CAD files or bitmap images
Compatible with I, h and g-line photoresists
Compatible with a wide range of substrates (silicon, glass, metal, plastic, …)
Compatible with any sample size up to 5” square masks
Camera feedback for alignment steps
Key benefits
Time and money saving thanks to the absence of a hardmask
Intuitive alignment method with a direct overlay of the design on the sample
Table-top, with a very small footprint
Technology well suited for microelectronics, 2D-materials, microfluidics, optoelectronics, optics or any other 2D micro-fabrication applications
